An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.