公开(公告)号：US10216095B2

公开(公告)日：2019-02-26

申请号：US14911452

申请日：2014-07-22

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Christianus Wilhelmus Johannes Berendsen ,  Anton Alexander Darhuber ,  Hubertus Mattheus Joseph Maria Wedershoven ,  Josephus Catharina Henricus Zeegers

IPC: G03B27/42 ,  G03B27/52 ,  G03F7/20

Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.