Invention Grant
- Patent Title: Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide
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Application No.: US15110229Application Date: 2015-01-19
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Publication No.: US10226757B2Publication Date: 2019-03-12
- Inventor: Won Choon Choi , Yong Ki Park , Woo Hyung Lee , Hwi Min Seo , Na Young Kang , Joo Hee Han , Dong Ho Lee , Gui Ryong Ahn , Gil Ho Kim
- Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY , HANWHA CHEMICAL CORPORATION
- Applicant Address: KR Yuseong-Gu, Daejeon
- Assignee: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
- Current Assignee: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
- Current Assignee Address: KR Yuseong-Gu, Daejeon
- Agency: Workman Nydegger
- Priority: KR10-2014-0008338 20140123
- International Application: PCT/KR2015/000518 WO 20150119
- International Announcement: WO2015/111885 WO 20150730
- Main IPC: B01J23/755
- IPC: B01J23/755 ; B01J10/00 ; B01J37/02 ; B01J23/72 ; B01J35/02 ; C01B33/107 ; B01J4/00 ; C01B33/06 ; B01J21/06
Abstract:
A method for preparing trichlorosilane according to an embodiment of the present invention comprises the steps of: supplying surface-modified metal silicide and metal grade silicon to a reaction unit; supplying silicon tetrachloride and hydrogen to the reaction unit; and supplying a product, which is generated by a reaction of metal grade silicon, silicon tetrachloride, and hydrogen in the presence of metal silicide in the reaction unit, to a separation unit, and separating a trichlorosilane component. In cases where a silicon tetrachloride hydrochlorination reaction is performed using the method for preparing trichlorosilane according to the embodiment of the present invention, the yield of trichlorosilane can be raised.
Public/Granted literature
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