Invention Grant
- Patent Title: Inert anode electroplating processor and replenisher
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Application No.: US14802859Application Date: 2015-07-17
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Publication No.: US10227707B2Publication Date: 2019-03-12
- Inventor: Gregory J. Wilson , Paul R. McHugh , John L. Klocke
- Applicant: APPLIED Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Perkins Coie LLP
- Agent Kenneth H. Ohriner
- Main IPC: C25B15/08
- IPC: C25B15/08 ; C25B15/02 ; C25B9/08 ; C25B9/18 ; C25B1/02 ; C25D21/18 ; C25D7/12 ; C25D17/10 ; C25D17/00 ; C25D17/06 ; C25D3/38

Abstract:
An electroplating processor has a vessel holding an electrolyte. An inert anode in the vessel has an anode wire within an anode membrane tube. A head for holds a wafer in contact with the electrolyte in the vessel. The wafer is connected to a cathode. A catholyte replenisher is connected to the vessel. The catholyte replenisher adds metal ions into the catholyte by moving ions of a bulk metal through a catholyte membrane in the catholyte replenisher.
Public/Granted literature
- US20170016137A1 INERT ANODE ELECTROPLATING PROCESSOR AND REPLENISHER Public/Granted day:2017-01-19
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