Invention Grant
- Patent Title: Energy controller for excimer-laser silicon crystallization
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Application No.: US15613662Application Date: 2017-06-05
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Publication No.: US10234765B2Publication Date: 2019-03-19
- Inventor: Igor Bragin
- Applicant: COHERENT LASERSYSTEMS GMBH & CO. KG
- Applicant Address: DE Göttingen
- Assignee: COHERENT LASERSYSTEMS GMBH & CO. KG
- Current Assignee: COHERENT LASERSYSTEMS GMBH & CO. KG
- Current Assignee Address: DE Göttingen
- Agency: Morrison & Foerster LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G03F7/20 ; H01S3/134 ; H01S3/225 ; H01S3/03 ; H01S3/038

Abstract:
Excimer laser annealing apparatus includes and excimer laser delivering laser-radiation pulses to a silicon layer supported on a substrate translated with respect to the laser pulses such that the consecutive pulses overlap on the substrate. The energy of each of the laser-radiation pulses is monitored, transmitted to control-electronics, and the energy of a next laser pulse is adjusted by a high-pass digital filter.
Public/Granted literature
- US20180348644A1 ENERGY CONTROLLER FOR EXCIMER-LASER SILICON CRYSTALLIZATION Public/Granted day:2018-12-06
Information query
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