Invention Grant
- Patent Title: Method of manufacturing vertical memory devices
-
Application No.: US15956851Application Date: 2018-04-19
-
Publication No.: US10236211B2Publication Date: 2019-03-19
- Inventor: Seok-Jung Yun , Joon-Hee Lee , Seong-Soon Cho
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2016-0004670 20160114
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/822 ; H01L27/11556 ; H01L27/11597 ; H01L27/11578 ; H01L27/1157 ; H01L27/11551 ; H01L29/792 ; H01L29/788 ; H01L21/28 ; H01L21/8234 ; H01L21/768 ; H01L27/105 ; H01L29/78 ; H01L27/11582 ; H01L49/02

Abstract:
A vertical memory device may include a plurality of word lines spaced apart in a first direction, each extending in a second direction perpendicular to the first direction and having a first width in a third direction perpendicular to the first and second directions, a dummy word line over an uppermost word line, including an opening and having a portion thereof with the first width in the third direction, a first string selection line (SSL) and a second string selection line (SSL) over the dummy word line, the first and second SSLs being at substantially the same level along the first direction, each of the first and second SSLs having a second width less than the first width in the third direction, and a plurality of vertical channel structures, each through the word lines, the dummy word line, and one of the first and second SSLs.
Public/Granted literature
- US20180240805A1 METHOD OF MANUFACTURING VERTICAL MEMORY DEVICES Public/Granted day:2018-08-23
Information query
IPC分类: