Invention Grant
- Patent Title: Selective dry etching of metal films comprising multiple metal oxides
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Application No.: US15606461Application Date: 2017-05-26
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Publication No.: US10242885B2Publication Date: 2019-03-26
- Inventor: Jeffrey W. Anthis , David Thompson , Benjamin Schmiege
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/465 ; H01L21/02 ; H01L21/3213 ; H01L21/28
Abstract:
A process to selectively etch a substrate surface comprising multiple metal oxides comprising exposing the substrate surface to a halogenation agent, and then exposing the substrate surface to a ligand transfer agent. The etch rate of the metals in the multiple metal oxides is substantially uniform.
Public/Granted literature
- US20180342403A1 Selective Dry Etching of Metal Films Comprising Multiple Metal Oxides Public/Granted day:2018-11-29
Information query
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