- 专利标题: Material measurement techniques using multiple X-ray micro-beams
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申请号: US15829947申请日: 2017-12-03
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公开(公告)号: US10247683B2公开(公告)日: 2019-04-02
- 发明人: Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
- 申请人: Sigray, Inc.
- 申请人地址: US CA Concord
- 专利权人: Sigray, Inc.
- 当前专利权人: Sigray, Inc.
- 当前专利权人地址: US CA Concord
- 代理机构: Knobbe, Martens, Olson & Bear, LLP
- 主分类号: G01N23/223
- IPC分类号: G01N23/223 ; G01N23/2204 ; G01N23/20025 ; G01N23/2055
摘要:
An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.
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