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1.发明公开公开(公告)号：US20230280291A1
公开(公告)日：2023-09-07
申请号：US18175171
申请日：2023-02-27
申请人： Sigray, Inc.
发明人： Wenbing Yun , Benjamin Donald Stripe , Frances Yenan Su , Vikaram Singh , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G01N23/223 , G01N23/2204
CPC分类号： G01N23/223 , G01N23/2204 , G01N2223/204 , G01N2223/206
摘要： A system includes a stage for supporting a sample having at least first and second atomic elements. The first atomic element has a first characteristic x-ray line with a first energy and the second atomic element has a second characteristic x-ray line with a second energy, the first and second energies lower than 8 keV and separated from one another by less than 1 keV. The system further includes an x-ray source of x-rays having a third energy between the first and second energies and at least one x-ray optic configured to receive and focus at least some of the x-rays as an x-ray beam to illuminate the sample. The system further includes at least one x-ray detector configured to detect fluorescence x-rays produced by the sample in response to being irradiated by the x-ray beam.
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公开(公告)号：US11549895B2
公开(公告)日：2023-01-10
申请号：US17476355
申请日：2021-09-15
申请人： Sigray, Inc.
IPC分类号： G01N23/20 , G01N23/223 , G01N23/2273 , G01N23/2206
摘要： A system and method for analyzing a three-dimensional structure of a sample includes generating a first x-ray beam having a first energy bandwidth less than 20 eV at full-width-at-half maximum and a first mean x-ray energy that is in a range of 1 eV to 1 keV higher than an absorption edge energy of a first atomic element of interest, and that is collimated to have a collimation angular range less than 7 mrad in at least one direction perpendicular to a propagation direction of the first x-ray beam; irradiating the sample with the first x-ray beam at a plurality of incidence angles relative to a substantially flat surface of the sample, the incidence angles of the plurality of incidence angles in a range of 3 mrad to 400 mrad; and simultaneously detecting a reflected portion of the first x-ray beam from the sample and detecting x-ray fluorescence x-rays and/or photoelectrons from the sample.
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公开(公告)号：US11056308B2
公开(公告)日：2021-07-06
申请号：US16560287
申请日：2019-09-04
申请人： Sigray, Inc.
发明人： Wenbing Yun , Janos Kirz
IPC分类号： H01J35/10 , H01J35/06 , H01J35/14 , G01N23/083 , H01J35/18 , G01N23/2273
摘要： A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.
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公开(公告)号：US20200350138A1
公开(公告)日：2020-11-05
申请号：US16866953
申请日：2020-05-05
申请人： Sigray, Inc.
摘要： An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.
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公开(公告)号：US10653376B2
公开(公告)日：2020-05-19
申请号：US16402887
申请日：2019-05-03
申请人： Sigray, Inc.
IPC分类号： A61B6/00 , A61B6/03 , H01J35/08 , H01J35/12 , G01N23/046 , G01N23/041 , A61B6/04
摘要： An x-ray imaging system includes an x-ray source, a beam-splitting grating having a plurality of structures arranged in a two-dimensional periodic array, a stage configured to hold an object to be imaged, and an x-ray detector having a two-dimensional array of x-ray detecting elements and positioned to detect x-rays diffracted by the beam-splitting grating and perturbed by the object to be imaged.
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公开(公告)号：US20200072770A1
公开(公告)日：2020-03-05
申请号：US16555143
申请日：2019-08-29
申请人： Sigray, Inc.
IPC分类号： G01N23/223 , G21K1/06 , G21K1/02
摘要： An x-ray optical filter includes at least one x-ray optical mirror configured to receive a plurality of x-rays having a first x-ray spectrum with a first intensity as a function of energy in a predetermined solid angle range and to separate at least some of the received x-rays by multilayer reflection or total external reflection into reflected x-rays and non-reflected x-rays and to form an x-ray beam including at least some of the reflected x-rays and/or at least some of the non-reflected x-rays. The x-ray beam has a second x-ray spectrum with a second intensity as a function of energy in the solid angle range, the second intensity greater than or equal to 50% of the first intensity across a first continuous energy range at least 3 keV wide, the second intensity less than or equal to 10% of the first intensity across a second continuous energy range at least 100 eV wide.
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公开(公告)号：US20200041428A1
公开(公告)日：2020-02-06
申请号：US16525198
申请日：2019-07-29
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , David Vina
摘要： An x-ray source and an x-ray interferometry system utilizing the x-ray source are provided. The x-ray source includes a target that includes a substrate and a plurality of structures. The substrate includes a thermally conductive first material and a first surface. The plurality of structures is on or embedded in at least a portion of the first surface. The structures are separate from one another and are in thermal communication with the substrate. The structures include at least one second material different from the first material, the at least one second material configured to generate x-rays upon irradiation by electrons having energies in an energy range of 0.5 keV to 160 keV. The x-ray source further includes an electron source configured to generate the electrons and to direct the electrons to impinge the target and to irradiate at least some of the structures along a direction that is at a non-zero angle relative to a surface normal of the portion of the first surface. The x-ray source further includes at least one optical element positioned such that at least some of the x-rays are transmitted through the first material and to or through the at least one optical element.
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公开(公告)号：US10304580B2
公开(公告)日：2019-05-28
申请号：US15954380
申请日：2018-04-16
申请人： Sigray, Inc.
IPC分类号： G01N23/00 , G21K1/02 , G01N23/083 , G21K7/00
摘要： Systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro-or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using a arrayed x-ray source and a set of Talbot interference fringes.
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公开(公告)号：US20190088438A9
公开(公告)日：2019-03-21
申请号：US15783855
申请日：2017-10-13
申请人： Sigray, Inc.
摘要： An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
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公开(公告)号：US20170336334A1
公开(公告)日：2017-11-23
申请号：US15663831
申请日：2017-07-31
申请人： Sigray, Inc.
IPC分类号： G01N23/207 , G01N23/087
CPC分类号： G01N23/2076 , G01N23/087 , G01N23/223 , G01N2223/04 , G01N2223/045 , G01N2223/0568 , G21K1/06 , G21K1/067 , G21K2201/064 , H01J35/08 , H01J35/14 , H01J35/18 , H01J2235/081 , H01J2235/086
摘要： An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.
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