System and method using x-rays for depth-resolving metrology and analysis

    公开(公告)号:US11549895B2

    公开(公告)日:2023-01-10

    申请号:US17476355

    申请日:2021-09-15

    申请人: Sigray, Inc.

    摘要: A system and method for analyzing a three-dimensional structure of a sample includes generating a first x-ray beam having a first energy bandwidth less than 20 eV at full-width-at-half maximum and a first mean x-ray energy that is in a range of 1 eV to 1 keV higher than an absorption edge energy of a first atomic element of interest, and that is collimated to have a collimation angular range less than 7 mrad in at least one direction perpendicular to a propagation direction of the first x-ray beam; irradiating the sample with the first x-ray beam at a plurality of incidence angles relative to a substantially flat surface of the sample, the incidence angles of the plurality of incidence angles in a range of 3 mrad to 400 mrad; and simultaneously detecting a reflected portion of the first x-ray beam from the sample and detecting x-ray fluorescence x-rays and/or photoelectrons from the sample.

    System and method for depth-selectable x-ray analysis

    公开(公告)号:US11056308B2

    公开(公告)日:2021-07-06

    申请号:US16560287

    申请日:2019-09-04

    申请人: Sigray, Inc.

    摘要: A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.

    Talbot X-ray microscope
    5.
    发明授权

    公开(公告)号:US10304580B2

    公开(公告)日:2019-05-28

    申请号:US15954380

    申请日:2018-04-16

    申请人: Sigray, Inc.

    摘要: Systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro-or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using a arrayed x-ray source and a set of Talbot interference fringes.

    X-RAY ILLUMINATION SYSTEM WITH MULTIPLE TARGET MICROSTRUCTURES

    公开(公告)号:US20190088438A9

    公开(公告)日:2019-03-21

    申请号:US15783855

    申请日:2017-10-13

    申请人: Sigray, Inc.

    摘要: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

    STRUCTURED TARGETS FOR X-RAY GENERATION
    9.
    发明申请
    STRUCTURED TARGETS FOR X-RAY GENERATION 审中-公开
    用于X射线发生的结构化目标

    公开(公告)号:US20160064175A1

    公开(公告)日:2016-03-03

    申请号:US14784029

    申请日:2014-08-29

    申请人: SINGRAY, INC

    摘要: Disclosed are targets for generating x-rays using electron beams and their method of fabrication. They comprise a number of microstructures fabricated from an x-ray target material arranged in close thermal contact with a substrate such that the heat is more efficiently drawn out of the x-ray target material. This allows irradiation of the x-ray generating substance with higher electron density or higher energy electrons, leading to greater x-ray brightness, without inducing damage or melting. The microstructures may comprise conventional x-ray target materials (such as tungsten) that are patterned at micron-scale dimensions on a thermally conducting substrate, such as diamond. The microstructures may have any number of geometric shapes to best generate x-rays of high brightness and efficiently disperse heat. In some embodiments, the target comprising microstructures may be incorporated into a rotating anode geometry, to enhance x-ray generation in such systems.

    摘要翻译: 公开了使用电子束产生X射线的目标及其制造方法。 它们包括由x射线靶材料制成的多个微结构,该X射线靶材料与衬底紧密地热接触地布置,使得热量更有效地从x射线靶材料中拉出。 这允许以更高的电子密度或更高能量的电子照射x射线产生物质,导致更大的x射线亮度,而不引起损伤或熔化。 微结构可以包括在诸如金刚石的导热基底上以微米级尺寸图案化的常规x射线靶材料(例如钨)。 微结构可以具有任何数量的几何形状,以最好地产生高亮度的x射线并有效地分散热量。 在一些实施例中,包括微结构的靶可以并入到旋转阳极几何中,以增强这种系统中的x射线产生。

    MICROFOCUS X-RAY SOURCE FOR GENERATING HIGH FLUX LOW ENERGY X-RAYS

    公开(公告)号:US20230218247A1

    公开(公告)日:2023-07-13

    申请号:US18152973

    申请日:2023-01-11

    申请人: Sigray, Inc.

    IPC分类号: A61B6/00

    CPC分类号: A61B6/40 A61B6/42

    摘要: An x-ray source includes at least one housing configured to contain a first region at a pressure less than one atmosphere and configured to separate the first region from an ambient environment outside the at least one housing. The at least one housing includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source within the at least one housing. The electron source is configured to generate at least one electron beam. The x-ray source further includes an anode assembly within the at least one housing and configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic within the at least one housing. The at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.