- Patent Title: Material measurement techniques using multiple X-ray micro-beams
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Application No.: US15829947Application Date: 2017-12-03
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Publication No.: US10247683B2Publication Date: 2019-04-02
- Inventor: Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
- Applicant: Sigray, Inc.
- Applicant Address: US CA Concord
- Assignee: Sigray, Inc.
- Current Assignee: Sigray, Inc.
- Current Assignee Address: US CA Concord
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: G01N23/223
- IPC: G01N23/223 ; G01N23/2204 ; G01N23/20025 ; G01N23/2055

Abstract:
An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.
Public/Granted literature
- US20180202951A1 MATERIAL MEASUREMENT TECHNIQUES USING MULTIPLE X-RAY MICRO-BEAMS Public/Granted day:2018-07-19
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