Invention Grant
- Patent Title: Gate oxide soft breakdown detection circuit
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Application No.: US15381992Application Date: 2016-12-16
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Publication No.: US10247770B2Publication Date: 2019-04-02
- Inventor: Abhay Deshpande , Arun S. Iyer , Prasanth K. Vallur , Girish Anathahally Singrigowda , Stephen V. Kosonocky
- Applicant: Advanced Micro Devices, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Zagorin Cave LLP
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H03K5/159 ; H03K3/03

Abstract:
Various embodiments of a gate oxide breakdown detection technique detect gate oxide degradation due to stress on a per part basis without destroying functional circuits for an intended application. Stress on the gate oxide may be applied while nominal drain currents flow through a device, thereby stressing the device under conditions similar to actual operating conditions. The technique is relatively fast and does not require analog amplifiers or tuning of substantial amounts of other additional circuitry as compared to conventional gate oxide breakdown detection techniques.
Public/Granted literature
- US20180172753A1 GATE OXIDE SOFT BREAKDOWN DETECTION CIRCUIT Public/Granted day:2018-06-21
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