Invention Grant
- Patent Title: Capacitor
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Application No.: US15209128Application Date: 2016-07-13
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Publication No.: US10256045B2Publication Date: 2019-04-09
- Inventor: Hiromasa Saeki , Noriyuki Inoue , Takeo Arakawa , Naoki Iwaji
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo-shi, Kyoto-Fu
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo-shi, Kyoto-Fu
- Agency: Arent Fox LLP
- Priority: JP2014-022624 20140207
- Main IPC: H01G9/032
- IPC: H01G9/032 ; H01G9/07 ; H01G9/00 ; H01G9/055 ; H01G9/15 ; H01G9/04 ; H01G9/045 ; H01G9/052
Abstract:
A capacitor that includes a porous metal base material, a first buffer layer formed by an atomic layer deposition method on the porous metal base material, a dielectric layer formed by an atomic layer deposition method on the first buffer layer, and an upper electrode formed on the dielectric layer.
Public/Granted literature
- US20160322171A1 CAPACITOR Public/Granted day:2016-11-03
Information query
