Invention Grant
- Patent Title: Semiconductor device with nanostructures and methods of forming the same
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Application No.: US15469646Application Date: 2017-03-27
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Publication No.: US10269990B2Publication Date: 2019-04-23
- Inventor: Hsin-Hsiang Tseng , Chih-Fei Lee , Chia-Pin Cheng , Fu-Cheng Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L31/0216
- IPC: H01L31/0216 ; H01L31/0232 ; H01L27/146 ; H01L31/112

Abstract:
A semiconductor device is provided, which includes a substrate and at least one nanostructure. The substrate has sensing pixels, and each of the sensing pixels has a photo sensing region for absorbing incident light. The nanostructure is directly on the photo sensing region. The nanostructure of each of the sensing pixels has a projected portion on an upper surface of the substrate, and a circle equivalent diameter of the projected portion of the nanostructure of each of the sensing pixels is substantially within a wavelength range of 100 nm to 1900 nm of the incident light configured to enter the substrate through the nanostructure.
Public/Granted literature
- US20180166592A1 SEMICONDUCTOR DEVICE AND METHODS OF FORMING THE SAME Public/Granted day:2018-06-14
Information query
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