Invention Grant
- Patent Title: Flow-rate regulator device, diluted chemical-liquid supply device, liquid processing apparatus and its operating system
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Application No.: US14850139Application Date: 2015-09-10
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Publication No.: US10276408B2Publication Date: 2019-04-30
- Inventor: Michitaka Amiya , Takami Satoh , Kazuyoshi Eshima , Akihiro Nakamura , Koji Tanaka , Kazuki Kosai
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-ku
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-225841 20131030; JP2014-086671 20140418; JP2014-195361 20140925
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B01D19/02 ; B01F3/08 ; B01F15/00 ; B01F15/02 ; B08B3/08 ; G05D7/01 ; G05D11/13
Abstract:
A flow-rate regulator device for controlling a flow rate of a liquid includes a first flow-rate regulator component positioned on an upstream side of a liquid line, and a second flow-rate regulator component positioned on a downstream side of the liquid line and connected in series to the first flow-rate regulator component. The first flow-rate regulator component adjusts a degree of opening such that a flow rate of liquid flowing through the liquid line is set a specified number of times greater than a target flow rate when the second flow-rate regulator component has a full opening, and the second flow-rate regulator component adjusts a degree of opening such that the flow rate of the liquid flowing through the liquid line is to be at the target flow rate when the first flow-rate regulator component is adjusted to have the degree of opening.
Public/Granted literature
Information query
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