Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US15796746Application Date: 2017-10-27
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Publication No.: US10283444B2Publication Date: 2019-05-07
- Inventor: Eiji Hayashi , Kyo Go , Kozo Harada , Shinji Baba
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2005-121063 20050419; JP2006-096999 20060331
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/31 ; H01L23/373 ; H01L23/00 ; H01L21/48 ; H01L23/46 ; H05K3/46 ; H01L21/683 ; H01L21/56 ; H01L23/36 ; H05K1/03 ; H01L21/60

Abstract:
Even when a stiffener is omitted, the semiconductor device which can prevent the generation of twist and distortion of a wiring substrate is obtained. As for a semiconductor device which has a wiring substrate, a semiconductor chip by which the flip chip bond was made to the wiring substrate, and a heat spreader adhered to the back surface of the semiconductor chip, and which omitted the stiffener for reinforcing a wiring substrate and maintaining the surface smoothness of a heat spreader, a wiring substrate has a plurality of insulating substrates in which a through hole whose diameter differs, respectively was formed, and each insulating substrate contains a glass cloth.
Public/Granted literature
- US20180068936A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-03-08
Information query
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