Invention Grant
- Patent Title: Electrode stack structure capable of preventing moisture from entering photodiode
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Application No.: US16012252Application Date: 2018-06-19
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Publication No.: US10283652B1Publication Date: 2019-05-07
- Inventor: Kuo-Hao Lee , Tsung-Chi Hsu , Ming-Chih Lai
- Applicant: LuxNet Corporation
- Applicant Address: TW Zhongli
- Assignee: LUXNET CORPORATION
- Current Assignee: LUXNET CORPORATION
- Current Assignee Address: TW Zhongli
- Agency: WPAT, PC
- Priority: TW107201632U 20180202
- Main IPC: H01L31/02
- IPC: H01L31/02 ; H01L31/0203 ; H01L31/0216 ; H01L27/12 ; H01L31/0224

Abstract:
The present invention provides an electrode stack structure capable of preventing moisture from entering a photodiode, comprising: a semiconductor layer; an inner electrode layer provided on the semiconductor layer; a dielectric layer coating a sidewall of the semiconductor layer; an intermediate metal layer provided on, bonded to, and in electrical conduction with the inner electrode layer, wherein the intermediate metal layer has a bottom side extending over and covering a portion of the dielectric layer to provide airtightness; and an anti-reflection layer coating on an outer side of the semiconductor layer, an outer side of the intermediate metal layer, and an outer side of the dielectric layer, with a groove formed in the anti-reflection layer by leaving a predetermined area of a top side of the intermediate metal layer uncoated or by removing a portion of the anti-reflection layer that coats the predetermined area of the top side of the intermediate metal layer, and an outer electrode layer plated on the predetermined area of the top side of the intermediate metal layer.
Information query
IPC分类: