- 专利标题: Photovoltaic devices with an interfacial band-gap modifying structure and methods for forming the same
-
申请号: US15229604申请日: 2016-08-05
-
公开(公告)号: US10283668B2公开(公告)日: 2019-05-07
- 发明人: Keith E. Fogel , Jeehwan Kim , Devendra K. Sadana , George S. Tulevski , Ahmed Abou-Kandil , Hisham S. Mohamed , Mohamed Saad , Osama Tobail
- 申请人: International Business Machines Corporation , EGYPT NANOTECHNOLOGY CENTER
- 申请人地址: US NY Armonk EG Cairo-Alexandria
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION,EGYPT NANOTECHNOLOGY CENTER
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION,EGYPT NANOTECHNOLOGY CENTER
- 当前专利权人地址: US NY Armonk EG Cairo-Alexandria
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 代理商 L. Jeffrey Kelly
- 主分类号: H01L31/0224
- IPC分类号: H01L31/0224 ; H01L31/18 ; H01L31/075 ; H01L31/0232 ; H01L31/07 ; H01L31/056 ; H01L31/028 ; H01L31/20 ; H01L31/0256
摘要:
A Schottky-barrier-reducing layer is provided between a p-doped semiconductor layer and a transparent conductive material layer of a photovoltaic device. The Schottky-barrier-reducing layer can be a conductive material layer having a work function that is greater than the work function of the transparent conductive material layer. The conductive material layer can be a carbon-material layer such as a carbon nanotube layer or a graphene layer. Alternately, the conductive material layer can be another transparent conductive material layer having a greater work function than the transparent conductive material layer. The reduction of the Schottky barrier reduces the contact resistance across the transparent material layer and the p-doped semiconductor layer, thereby reducing the series resistance and increasing the efficiency of the photovoltaic device.
公开/授权文献
信息查询
IPC分类: