Invention Grant
- Patent Title: Inspection method and apparatus, and corresponding lithographic apparatus
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Application No.: US13667174Application Date: 2012-11-02
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Publication No.: US10295913B2Publication Date: 2019-05-21
- Inventor: Scott Anderson Middlebrooks , Rene Andreas Maria Pluijms , Martyn John Coogans , Marc Johannes Noot
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An inspection method, and corresponding apparatus, enables classification of pupil images according to a process variable. The method comprises acquiring diffraction pupil images of a plurality of structures formed on a substrate during a lithographic process. A process variable of the lithographic process varies between formation of the structures, the variation of the process variable resulting in a variation in the diffraction pupil images. The method further comprises determining at least one discriminant function for the diffraction pupil images, the discriminant function being able to classify the pupil images in terms of the process variable.
Public/Granted literature
- US20130135600A1 Inspection Method and Apparatus, and Corresponding Lithographic Apparatus Public/Granted day:2013-05-30
Information query
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