Invention Grant
- Patent Title: Bipolar transistor and method for producing the same
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Application No.: US15957702Application Date: 2018-04-19
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Publication No.: US10297680B2Publication Date: 2019-05-21
- Inventor: Yasunari Umemoto , Shigeki Koya , Atsushi Kurokawa
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-fu
- Agency: Studebaker & Brackett PC
- Priority: JP2016-245282 20161219
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/737 ; H01L29/06 ; H01L29/08 ; H01L29/36 ; H01L29/66 ; H01L29/10 ; H01L21/306 ; H01L29/205

Abstract:
A bipolar transistor has a subcollector layer and a stack of collector, base, and emitter layers on the subcollector layer. On the subcollector layer are collector electrodes. On the base layer are base electrodes. The collector layer includes multiple doped layers with graded impurity concentrations, higher on the subcollector layer side and lower on the base layer side. Of these doped layers, the one having the highest impurity concentration is in contact with the subcollector layer and has a sheet resistance less than or equal to about nine times that of the subcollector layer.
Public/Granted literature
- US20180248023A1 BIPOLAR TRANSISTOR AND METHOD FOR PRODUCING THE SAME Public/Granted day:2018-08-30
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