Invention Grant
- Patent Title: Photoelectric conversion element and imaging element
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Application No.: US15350472Application Date: 2016-11-14
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Publication No.: US10297774B2Publication Date: 2019-05-21
- Inventor: Daigo Sawaki
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2014-157098 20140731
- Main IPC: H01L51/42
- IPC: H01L51/42 ; H01L31/10 ; H01L27/30 ; H01L27/146 ; H01L51/44 ; H01L51/00

Abstract:
Provided is a photoelectric conversion element including: a lower electrode, a charge blocking layer which suppresses injection of a charge from the lower electrode, an organic layer which includes a photoelectric conversion layer, and an upper electrode which includes a transparent electrode layer, which are laminated in this order on a substrate. The photoelectric conversion layer is configured of an amorphous film and has a bulk hetero-structure of a P-type organic semiconductor and an N-type organic semiconductor formed of fullerenes. A difference between the ionization potential of the photoelectric conversion layer having the bulk hetero-structure and the electron affinity of the N-type semiconductor is 1.30 eV or greater.
Public/Granted literature
- US20170062746A1 PHOTOELECTRIC CONVERSION ELEMENT AND IMAGING ELEMENT Public/Granted day:2017-03-02
Information query
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