- 专利标题: Alternating hardmasks for tight-pitch line formation
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申请号: US15445112申请日: 2017-02-28
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公开(公告)号: US10312103B2公开(公告)日: 2019-06-04
- 发明人: Sean D. Burns , Nelson M. Felix , Chi-Chun Liu , Yann A. M. Mignot , Stuart A. Sieg
- 申请人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 代理机构: Tutunjian & Bitetto, P.C.
- 代理商 Vazken Alexanian
- 主分类号: H01L21/308
- IPC分类号: H01L21/308 ; H01L21/3065 ; H01L29/66
摘要:
A method for forming fins includes forming a three-color hardmask fin pattern on a fin base layer. The three-color hardmask fin pattern has hardmask fins of three mutually selectively etchable compositions. A region on the three-color hardmask fin pattern is masked, leaving one or more fins of a first color exposed. All exposed fins of the first color are etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second color are etched away. Fins are etched into the fin base layer by anisotropically etching around remaining fins of the first color and fins of the third color.
公开/授权文献
- US20180247824A1 ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION 公开/授权日:2018-08-30
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