Invention Grant
- Patent Title: Substrate with antireflection layer
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Application No.: US14878054Application Date: 2015-10-08
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Publication No.: US10324234B2Publication Date: 2019-06-18
- Inventor: Kenji Ishizeki , Akira Isobe , Yuki Hatanaka , Yohei Kawai , Takashige Yoneda , Keisuke Abe
- Applicant: AGC Inc.
- Applicant Address: JP Tokyo
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-091568 20130424
- Main IPC: G02B1/111
- IPC: G02B1/111 ; C09D127/24 ; C09D5/00 ; C01B33/18 ; C03C17/00 ; C03C17/25 ; G02B1/18 ; C09D7/40 ; G02B27/00 ; B01J13/18

Abstract:
The present invention provides a substrate with an antireflection layer not only which is excellent in the antireflection properties but also which has high water repellency and oil repellency and favorable oil and fat stain removability, and a display device provided with a substrate with an antireflection layer.A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate, wherein the antireflection layer contains a silica porous film having fluorinated organic groups, and the surface of the antireflection layer on the opposite side from the substrate has an element number ratio F/Si of at least 1 as obtained from the peak height of F1s and the peak height of Si2p in surface analysis by scanning X-ray photoelectron spectroscopy (ESCA) and has an arithmetic mean roughness (Sa) of at most 3.0 nm.
Public/Granted literature
- US20160025899A1 SUBSTRATE WITH ANTIREFLECTION LAYER Public/Granted day:2016-01-28
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