Invention Grant
- Patent Title: Aberration computing device, aberration computing method, image processor, image processing method, and electron microscope
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Application No.: US14706308Application Date: 2015-05-07
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Publication No.: US10332721B2Publication Date: 2019-06-25
- Inventor: Shigeyuki Morishita
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2014-96832 20140508
- Main IPC: G01M11/02
- IPC: G01M11/02 ; H01J37/26 ; H01J37/153 ; H01J37/295
Abstract:
An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.
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