Invention Grant
- Patent Title: Memory cells comprising a programmable field effect transistor having a reversibly programmable gate insulator
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Application No.: US15944270Application Date: 2018-04-03
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Publication No.: US10332910B2Publication Date: 2019-06-25
- Inventor: Ferdinando Bedeschi
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: G11C15/02
- IPC: G11C15/02 ; H01L27/11597 ; H01L29/78 ; H01L27/1159 ; H01L27/11587 ; H01L29/423 ; H01L27/1157 ; H01L27/11582

Abstract:
A memory cell comprises an elevationally extending programmable field effect transistor comprising a gate insulator that is reversibly programmable into two programmable states characterized by two different Vt's of the programmable transistor. The programmable transistor comprises a top source/drain region and a bottom source/drain region. A bottom select device is electrically coupled in series with and elevationally inward of the bottom source/drain region of the programmable transistor. A top select device is electrically coupled in series with and is elevationally outward of the top source/drain region of the programmable transistor. A bottom select line is electrically coupled in series with and is elevationally inward of the bottom select device. A top select line is electrically coupled in series with and is elevationally outward of the top select device. Other embodiments are disclosed.
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