Invention Grant
- Patent Title: Method and apparatus for valve deposition cleaning and prevention by plasma discharge
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Application No.: US14994668Application Date: 2016-01-13
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Publication No.: US10337105B2Publication Date: 2019-07-02
- Inventor: Gordon Hill
- Applicant: MKS Instruments, Inc.
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Proskauer Rose LLP
- Main IPC: F16K1/22
- IPC: F16K1/22 ; F16K3/06 ; F16K15/02 ; F16K51/02 ; H01J37/32 ; C23C16/513

Abstract:
A valve assembly is provided that comprises a vacuum valve including a body and an electrically grounded surface on at least a surface of the body and an electrode extending substantially parallel to the electrically grounded surface and adjacent to the vacuum valve. The vacuum valve assembly also includes a barrier dielectric, a least a portion of which is located between the electrode and the electrically grounded surface. The vacuum valve assembly further includes a dielectric barrier discharge structure formed from the electrically grounded surface, the electrode, and the barrier dielectric. The dielectric barrier discharge structure is adapted to generate a plasma on the electrically grounded surface to clean at least a portion of the vacuum valve.
Public/Granted literature
- US20170198396A1 Method and Apparatus for Valve Deposition Cleaning and Prevention by Plasma Discharge Public/Granted day:2017-07-13
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