发明授权
- 专利标题: Polycrystalline silicon rod, production method therefor, and FZ silicon single crystal
-
申请号: US15548569申请日: 2015-12-10
-
公开(公告)号: US10343922B2公开(公告)日: 2019-07-09
- 发明人: Shuichi Miyao , Shigeyoshi Netsu
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2015-030344 20150219
- 国际申请: PCT/JP2015/006156 WO 20151210
- 国际公布: WO2016/132411 WO 20160825
- 主分类号: C01B33/02
- IPC分类号: C01B33/02 ; C01B33/035 ; G01N23/20 ; C30B29/06 ; C23C16/24 ; C30B13/00 ; C30B28/14
摘要:
A plate-shaped sample with a cross-section perpendicular to a radial direction of a polycrystalline silicon rod as a principal surface is sampled from a region from a center (r=0) of the polycrystalline silicon rod to R/3. Then, the sample is disposed at a position at which a Bragg reflection from a (111) Miller index plane is detected. In-plane rotation with a rotational angle φ on the sample is performed with a center of the sample as a rotational center such that an X-ray irradiation region defined by a slit performs φ-scanning on the principal surface of the sample to obtain a diffraction chart indicating dependency of a Bragg reflection intensity from the (111) Miller index plane on a rotational angle of the sample. A ratio (Sp/St) between an area Sp of a peak part appearing in the diffraction chart and a total area St of the diffraction chart is calculated.
公开/授权文献
信息查询