Shielding strategy for mitigation of stray field for permanent magnet array

    公开(公告)号:US11927549B2

    公开(公告)日:2024-03-12

    申请号:US17470183

    申请日:2021-09-09

    申请人: KLA Corporation

    摘要: The present disclosure provides an inspection system and a method of stray field mitigation. The system includes an array of electron beam columns, a first permanent magnet array, and a plurality of shielding plates. The array of electron beam columns each includes an electron source configured to emit electrons toward a stage. The first permanent magnet array is configured to condense the electrons from each electron source into an array of electron beams. The first permanent magnet array is arranged at a first end of the array of electron beam columns. The plurality of shielding plates extend across the array electron beam columns downstream of the first permanent magnet array in a direction of electron emission. The array of electron beams pass through a plurality of apertures in each of the plurality of shielding plates, which reduces stray magnetic field in a radial direction of the array of electron beams.

    Material analysis method
    9.
    发明授权

    公开(公告)号:US11859965B2

    公开(公告)日:2024-01-02

    申请号:US17736107

    申请日:2022-05-04

    IPC分类号: G01N23/00 G01B15/04 G01N23/20

    摘要: A material analysis method is provided. A plurality of wafers processed from a plurality of ingots are measured by a measuring instrument to obtain an average of a bow of each of the wafers processed from the ingots and a plurality of full widths at half maximum (FWHM) of each of the wafers. Key factors respectively corresponding to the ingots are calculated according to the FWHM of the wafers. A regression equation is obtained according to the key factors and the average of the bows.