- 专利标题： Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
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申请号： US14258489申请日： 2014-04-22
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公开(公告)号： US10345706B2公开(公告)日： 2019-07-09
- 发明人: Hyun-Ji Song , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Yoo-Jeong Choi , Seung-Hee Hong
- 申请人： Hyun-Ji Song , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Yoo-Jeong Choi , Seung-Hee Hong
- 申请人地址： KR Gumi-si, Gyeongsangbuk-do
- 专利权人： CHEIL INDUSTRIES, INC.
- 当前专利权人： CHEIL INDUSTRIES, INC.
- 当前专利权人地址： KR Gumi-si, Gyeongsangbuk-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2013-0073947 20130626; KR10-2013-0073948 20130626; KR10-2013-0073949 20130626
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; G03F7/38 ; G03F7/36 ; G03F7/30 ; G03F7/09 ; G03F7/11 ; C07C39/12 ; C07C323/19 ; C07C217/58 ; C07C22/04 ; C07C255/53 ; C07C39/225 ; C07D215/14 ; C07D333/16 ; C07D333/50 ; C07D311/58
摘要：
A monomer for a hardmask composition is represented by the following Chemical Formula 1,
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