Invention Grant
- Patent Title: Power semiconductor device with dV/dt controllability through select trench electrode biasing, and method of manufacturing the same
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Application No.: US15704269Application Date: 2017-09-14
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Publication No.: US10347754B2Publication Date: 2019-07-09
- Inventor: Alexander Philippou , Christian Jaeger , Johannes Georg Laven , Max Christian Seifert , Antonio Vellei
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102016117264 20160914
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/40 ; H01L29/41 ; H01L29/66 ; H01L29/739 ; H01L29/866

Abstract:
A power semiconductor device is disclosed. In one example, the device comprises a semiconductor body coupled to a first load terminal and a second load terminal and comprising a drift region configured to conduct a load current between said terminals. The drift region comprises dopants of a first conductivity type. A source region is arranged in electrical contact with the first load terminal and comprises dopants of the first conductivity type. A channel region comprises dopants of a second conductivity. At least one power unit cell that includes at least one first type trench. The at least one power unit cell further includes a first mesa zone and a second mesa zone of the semiconductor body.
Public/Granted literature
- US20180076309A1 POWER SEMICONDUCTOR DEVICE WITH DV/DT CONTROLLABILITY Public/Granted day:2018-03-15
Information query
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