Invention Grant
- Patent Title: Method for producing semiconductor chip
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Application No.: US16037537Application Date: 2018-07-17
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Publication No.: US10354973B2Publication Date: 2019-07-16
- Inventor: Makoto Orikasa , Hideyuki Seike , Yuhei Horikawa , Hisayuki Abe
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/00 ; H01L25/00 ; H01L25/065

Abstract:
A method for producing a semiconductor chip is a method for producing a semiconductor chip that includes a substrate, a conductive portion formed on the substrate, and a microbump formed on the conductive portion, which includes a smooth surface formation process of forming a smooth surface on the microbump, and the smooth surface formation process includes a heating process of causing a reducing gas to flow in an inert atmosphere into a space where the semiconductor chips are arranged and heated at or higher than a temperature of a melting point of the microbump, and in the heating process, a pressure application member is mounted on the microbump and among principal surfaces of the pressure application member, a principal surface that contacts the microbump is a flat surface.
Public/Granted literature
- US20190013293A1 METHOD FOR PRODUCING SEMICONDUCTOR CHIP Public/Granted day:2019-01-10
Information query
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