- Patent Title: Selective deposition through formation of self-assembled monolayers
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Application No.: US15587997Application Date: 2017-05-05
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Publication No.: US10366878B2Publication Date: 2019-07-30
- Inventor: Jessica Sevanne Kachian , Tobin Kaufman-Osborn , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/56 ; C23C16/455 ; C23C16/40 ; C23C16/04 ; C23C16/02 ; H01L21/3105 ; H01L21/768
Abstract:
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include net chemisorption of a self-assembled monolayer on the second surface to prevent deposition of the film on the second surface.
Public/Granted literature
- US20170323781A1 Selective Deposition Through Formation Of Self-Assembled Monolayers Public/Granted day:2017-11-09
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