Invention Grant
- Patent Title: Transistor structure
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Application No.: US15427656Application Date: 2017-02-08
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Publication No.: US10367068B2Publication Date: 2019-07-30
- Inventor: Sotirios Athanasiou , Philippe Galy
- Applicant: STMicroelectronics SA
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics SAA
- Current Assignee: STMicroelectronics SAA
- Current Assignee Address: FR Montrouge
- Agency: Crowe & Dunlevy
- Priority: GR160100358 20160705; FR1657587 20160805
- Main IPC: H01L29/36
- IPC: H01L29/36 ; H01L29/786

Abstract:
A transistor includes a quasi-intrinsic region of a first conductivity type that is covered with an insulated gate. The quasi-intrinsic region extends between two first doped regions of a second conductivity type. A main electrode is provided on each of the two first doped regions. A second doped region of a second conductivity type is position in contact with the quasi-intrinsic region, but is electrically and physically separated by a distance from the two first doped regions. A control electrode is provided on the second doped region.
Public/Granted literature
- US20180012965A1 TRANSISTOR STRUCTURE Public/Granted day:2018-01-11
Information query
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