Invention Grant
- Patent Title: Resistive memory with bird beak shaped structure method for fabricating the same and applications thereof
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Application No.: US15291203Application Date: 2016-10-12
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Publication No.: US10388698B2Publication Date: 2019-08-20
- Inventor: Po-Hao Tseng , Dai-Ying Lee , Erh-Kun Lai
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW105116939A 20160530
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
A resistive memory includes a semiconductor substrate, a dielectric layer, an insulating layer and a metal electrode layer. The semiconductor substrate has a top surface and a recess extending downwards into the semiconductor substrate from the top surface. The dielectric layer is disposed on the semiconductor substrate and has a first through-hole aligning the recess. The insulating layer is disposed in the first through-hole and the recess. The metal electrode layer is disposed on the insulating layer by which the metal electrode layer is isolated from the semiconductor substrate.
Public/Granted literature
- US20170345870A1 RESISTIVE MEMORY METHOD FOR FABRICATING THE SAME AND APPLICATIONS THEREOF Public/Granted day:2017-11-30
Information query
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