Invention Grant
- Patent Title: Radiation source and lithographic apparatus
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Application No.: US15661888Application Date: 2017-07-27
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Publication No.: US10394141B2Publication Date: 2019-08-27
- Inventor: Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20 ; G21K5/08 ; G21K1/06 ; F15D1/00
Abstract:
A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
Public/Granted literature
- US20170322499A1 Radiation Source and Lithographic Apparatus Public/Granted day:2017-11-09
Information query
