公开(公告)号：US10394141B2

公开(公告)日：2019-08-27

申请号：US15661888

申请日：2017-07-27

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: H05G2/00 ,  G03F7/20 ,  G21K5/08 ,  G21K1/06 ,  F15D1/00

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US20170322499A1

公开(公告)日：2017-11-09

申请号：US15661888

申请日：2017-07-27

Applicant: ASML Netherlands B.V.

Inventor： Michel RIEPEN ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: G03F7/20 ,  H05G2/00 ,  F15D1/00 ,  G21K1/06 ,  G21K5/08

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US09753383B2

公开(公告)日：2017-09-05

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US09983489B2

公开(公告)日：2018-05-29

申请号：US15311548

申请日：2015-04-24

Applicant: ASML Netherlands B.V.

Inventor： Christianus Wilhelmus Johannes Berendsen ,  Marcel Beckers ,  Henricus Jozef Castelijns ,  Hubertus Antonius Geraets ,  Adrianus Hendrik Koevoets ,  Leon Martin Levasier ,  Peter Schaap ,  Bob Streefkerk ,  Siegfried Alexander Tromp

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：US09971255B2

公开(公告)日：2018-05-15

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US20170176875A1

公开(公告)日：2017-06-22

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US09588437B2

公开(公告)日：2017-03-07

申请号：US14975481

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 以及线性阵列中的至少部分地围绕并径向向外的一个或多个弯液面钉扎特征的多个气体供应开口，其中线性阵列中的多个气体供应开口具有相似或相同的尺寸。