- Patent Title: High silica content substrate such as for use in thin-film battery
-
Application No.: US15461953Application Date: 2017-03-17
-
Publication No.: US10396393B2Publication Date: 2019-08-27
- Inventor: Daniel Warren Hawtof , Archit Lal
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Russell S. Magaziner
- Main IPC: H01M10/04
- IPC: H01M10/04 ; H01M4/66 ; H01M4/485 ; H01M4/505 ; H01M4/525 ; H01M10/0585 ; H01M10/0525 ; H01M6/40 ; H01M4/38 ; H01M4/587 ; H01M4/58 ; H01M4/02

Abstract:
A high silica content substrate, such as for a thin-film battery, is provided. The substrate has a high silica content, such as over 90% by weight silica, and is thin, for example less than 500 μm. The substrate may include a surface with a topography or profile that facilitates bonding with a coating layer, such as a coating of an electrochemical battery material. The high silica content substrate may be flexible, have high temperature resistance, high strength and/or be non-reactive. The substrate may be suitable for use in the high temperature environments used in many chemical deposition or formation processes, such as electrochemical battery material formation processes.
Public/Granted literature
- US20180123160A1 HIGH SILICA CONTENT SUBSTRATE SUCH AS FOR USE IN THIN-FILM BATTERY Public/Granted day:2018-05-03
Information query