Invention Grant
- Patent Title: Method for treating pattern structure, method for manufacturing electronic device, and treatment liquid for inhibiting collapse of pattern structure
-
Application No.: US15854778Application Date: 2017-12-27
-
Publication No.: US10403491B2Publication Date: 2019-09-03
- Inventor: Atsushi Mizutani , Tadashi Inaba
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP2015-139598 20150713
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B08B3/08 ; C08K3/16 ; C08K5/17 ; B81C1/00
Abstract:
Provided are a method for treating a pattern structure which is capable of inhibiting collapse of a pattern structure, a method for manufacturing an electronic device including such a treatment method, and a treatment liquid for inhibiting collapse of a pattern structure. The method for treating a pattern structure includes applying a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom to a pattern structure formed of an inorganic material.
Public/Granted literature
Information query
IPC分类:
