Invention Grant
- Patent Title: Tall single-fin FIN-type field effect transistor structures and methods
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Application No.: US15862064Application Date: 2018-01-04
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Publication No.: US10411010B2Publication Date: 2019-09-10
- Inventor: Ruilong Xie , Andreas Knorr , Murat Kerem Akarvardar , Lars Liebmann , Nigel Graeme Cave
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Gibb & Riley, LLC
- Agent Francois Pagette
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/45 ; H01L29/423 ; H01L21/8234 ; H01L29/66 ; H01L21/8238 ; H01L29/78 ; H01L27/092

Abstract:
Disclosed are methods of forming improved fin-type field effect transistor (FINFET) structures and, particularly, relatively tall single-fin FINFET structures that provide increased drive current over conventional single-fin FINFET structures. The use of such a tall single-fin FINFET provides significant area savings over a FINFET that requires multiple semiconductor fins to achieve the same amount of drive current. Furthermore, since only a single fin is used, only a single leakage path is present at the bottom of the device. Thus, the disclosed FINFET structures can be incorporated into a cell in place of multi-fin FINFETs in order to allow for cell height scaling without violating critical design rules or sacrificing performance.
Public/Granted literature
- US20180182757A1 TALL SINGLE-FIN FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURES AND METHODS Public/Granted day:2018-06-28
Information query
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