Invention Grant
- Patent Title: Processing device and processing method
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Application No.: US15300207Application Date: 2015-01-26
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Publication No.: US10442032B2Publication Date: 2019-10-15
- Inventor: Saneyuki Goya , Kenji Muta , Toshiya Watanabe , Takashi Ishide
- Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Current Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-074055 20140331
- International Application: PCT/JP2015/052073 WO 20150126
- International Announcement: WO2015/151562 WO 20151008
- Main IPC: B23K26/062
- IPC: B23K26/062 ; B23K26/082 ; B23K26/21 ; B23K26/32 ; B23K26/342 ; H01S5/042 ; B23K26/40 ; H01S5/024 ; H01S5/42 ; H01S5/00 ; H01S5/40 ; B23K26/0622 ; B23K26/38 ; B23K26/08 ; B23K26/34 ; B23K103/04

Abstract:
Provided are a processing device and a processing method with which the device can be made more compact, and with which highly precise processing can be performed. The processing device, which processes a member to be processed by irradiating the member to be processed with a laser, has: a laser oscillator having a plurality of vertical cavity surface-emitting laser diode chips that output laser light having a wavelength of 1,070 nm or less, and a substrate on the surface of which the plurality of vertical cavity surface-emitting laser diode chips are arranged in a matrix; a guidance optical system that guides the laser light output from the laser oscillator; and a control device that controls the output of the laser oscillator.
Public/Granted literature
- US20170182590A1 PROCESSING DEVICE AND PROCESSING METHOD Public/Granted day:2017-06-29
Information query
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