Invention Grant
- Patent Title: Lithographic method and apparatus
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Application No.: US16098350Application Date: 2017-04-05
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Publication No.: US10444635B2Publication Date: 2019-10-15
- Inventor: Carolus Johannes Catharina Schoormans , Johannes Jacobus Matheus Baselmans , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Aldegonda Theodorus Marie Van Den Homberg , Maksym Yuriiovych Sladkov , Andreas Johannes Antonius Brouns , Alexander Viktorovych Padiy
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16168284 20160504
- International Application: PCT/EP2017/058057 WO 20170405
- International Announcement: WO2017/190905 WO 20171109
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20 ; G03F9/00

Abstract:
A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
Public/Granted literature
- US20190163072A1 Lithographic Method and Apparatus Public/Granted day:2019-05-30
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