Invention Grant
- Patent Title: Distortion correction method and electron microscope
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Application No.: US16012057Application Date: 2018-06-19
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Publication No.: US10446362B2Publication Date: 2019-10-15
- Inventor: Shigeyuki Morishita
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2017-120642 20170620
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/22 ; H01J37/14 ; H01J37/28 ; H01J37/302

Abstract:
There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.
Public/Granted literature
- US20180366295A1 Distortion Correction Method and Electron Microscope Public/Granted day:2018-12-20
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