Invention Grant
- Patent Title: Rotatable substrate support having radio frequency applicator
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Application No.: US15582282Application Date: 2017-04-28
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Publication No.: US10460915B2Publication Date: 2019-10-29
- Inventor: Satoru Kobayashi , Kirby Hane Floyd , Hiroji Hanawa , Soonam Park , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01J37/32 ; H02K7/14

Abstract:
A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.
Public/Granted literature
- US20170236693A1 ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR Public/Granted day:2017-08-17
Information query
IPC分类: