Invention Grant
- Patent Title: Gas mixer and semiconductor device fabricating apparatuses including the same
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Application No.: US15208787Application Date: 2016-07-13
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Publication No.: US10468234B2Publication Date: 2019-11-05
- Inventor: Hongtaek Lim , Kangsoo Kim , Hojun Kim , Jeonghoon Nam , Sejun Park
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0132503 20150918
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C16/455 ; C23C16/50 ; H01J37/32
Abstract:
A semiconductor device fabricating apparatus includes a gas mixer having an upper surface and a lower surface, each of the upper and lower surfaces has an elliptical plane, and a side surface connecting the upper and lower surfaces, a gas inlet pipe on an upper portion of the gas mixer, and a gas outlet pipe on a lower portion of the gas mixer.
Public/Granted literature
- US20170084471A1 GAS MIXER AND SEMICONDUCTOR DEVICE FABRICATING APPARATUSES INCLUDING THE SAME Public/Granted day:2017-03-23
Information query
IPC分类:
