公开(公告)号：US10468234B2

公开(公告)日：2019-11-05

申请号：US15208787

申请日：2016-07-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hongtaek Lim ,  Kangsoo Kim ,  Hojun Kim ,  Jeonghoon Nam ,  Sejun Park

IPC: H01L21/67 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32

Abstract: A semiconductor device fabricating apparatus includes a gas mixer having an upper surface and a lower surface, each of the upper and lower surfaces has an elliptical plane, and a side surface connecting the upper and lower surfaces, a gas inlet pipe on an upper portion of the gas mixer, and a gas outlet pipe on a lower portion of the gas mixer.