- Patent Title: Three-dimensional semiconductor devices including gate electrodes
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Application No.: US16015702Application Date: 2018-06-22
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Publication No.: US10468433B2Publication Date: 2019-11-05
- Inventor: Kwang Soo Kim , Young Jin Jung , Jae Duk Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2017-0145848 20171103
- Main IPC: H01L27/1159
- IPC: H01L27/1159 ; H01L27/11597 ; H01L27/11578 ; H01L27/11568 ; H01L27/11556 ; H01L27/11551 ; H01L27/11595 ; H01L27/11526 ; H01L27/11521 ; H01L27/11519 ; H01L27/11548 ; H01L27/1156 ; H01L27/11565 ; H01L27/11575 ; H01L27/11582 ; H01L27/02 ; H01L29/10 ; H01L29/423 ; H01L21/033 ; H01L21/311 ; H01L29/66 ; H01L29/792

Abstract:
A three-dimensional semiconductor device is provided including main separation structures disposed on a substrate, and extending in a first direction, parallel to a surface of the substrate; gate electrodes disposed between the main separation structures; a first secondary separation structure penetrating through the gate electrodes, between the main separation structures, and including a first linear portion and a second linear portion, having end portions opposing each other; and second secondary separation structures disposed between the first secondary separation structure and the main separation structures, and penetrating through the gate electrodes. The second secondary separation structures have end portions opposing each other between the second linear portion and the main separation structures.
Public/Granted literature
- US20190139985A1 Three-Dimensional Semiconductor Devices Including Gate Electrodes Public/Granted day:2019-05-09
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