- Patent Title: Compositions and methods for selectively etching titanium nitride
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Application No.: US14772652Application Date: 2014-03-04
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Publication No.: US10472567B2Publication Date: 2019-11-12
- Inventor: Li-Min Chen , Emanuel I. Cooper , Steven Lippy , Lingyan Song , Chia-Jung Hsu , Sheng-Hung Tu , Chieh Ju Wang
- Applicant: Entegris, Inc.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Agency: Entegris, Inc.
- International Application: PCT/US2014/020312 WO 20140304
- International Announcement: WO2014/138064 WO 20140912
- Main IPC: C09K13/00
- IPC: C09K13/00 ; H01L21/3213 ; C23F1/14 ; C23F1/26 ; C23G1/02 ; C09K13/08 ; C09K13/10 ; G03F7/42
Abstract:
Semi-aqueous compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten and copper, and insulating materials from a microelectronic device having same thereon. The semi-aqueous compositions contain at least one oxidant, at least one etchant, and at least one organic solvent, may contain various corrosion inhibitors to ensure selectivity.
Public/Granted literature
- US20160032186A1 COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE Public/Granted day:2016-02-04
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