公开(公告)号：US20230121639A1

公开(公告)日：2023-04-20

申请号：US17968286

申请日：2022-10-18

申请人： ENTEGRIS, INC.

发明人： Hyongpyo Hong ,  Chia-Jung Hsu ,  Atanu K. Das

IPC分类号： C09K13/06 ,  H05K3/06

摘要： A composition and method for etching molybdenum-containing film on a microelectronic device substrate is provided. A microelectronic device substrate is contacted with the composition of the invention for a time sufficient to at least partially remove the molybdenum-containing film. The composition comprises at least one oxidizing agent, at least one complexing agent, at least one cationic surfactant, and has a pH of from about 7.5 to about 13. The etchant composition selectively removes molybdenum at an etch rate of about 20 to 50 Å/minute at room temperature, with improved uniformity of removal.

公开(公告)号：US20230113646A1

公开(公告)日：2023-04-13

申请号：US17959792

申请日：2022-10-04

申请人： ENTEGRIS, INC.

发明人： Scott L. Battle ,  Benjamin Cardozo ,  Chase Parker

IPC分类号： C23C16/455 ,  G01G17/04

摘要： A precursor delivery system for determining material levels and related methods can include an ampoule and at least one tray disposed in the ampoule. The at least one tray may be configured to hold an amount of a precursor material. A load cell assembly is also included. The load cell assembly may include a load cell. The load cell assembly may be coupled to the at least one tray in a configuration sufficient for the at least one tray to exert a mechanical force upon the load cell. This mechanical force may be correlative to the amount of precursor material present on the at least one tray and thus may be used to determine material levels within the ampoule.

公开(公告)号：US11618016B2

公开(公告)日：2023-04-04

申请号：US17503986

申请日：2021-10-18

申请人： ENTEGRIS, INC.

发明人： Jad Ali Jaber ,  Alketa Gjoka ,  Saksatha Ly

IPC分类号： B01J47/12 ,  B01D67/00 ,  B01D69/02 ,  B01D71/68 ,  B01D71/78 ,  B01J39/05 ,  B01J39/19 ,  B01J41/07 ,  B01J41/13 ,  C08G81/02 ,  C08J5/22 ,  C08J7/12

摘要： A polysulfone membrane is modified so that monomers are wafted onto the surface of the membrane. The polysulfone membranes can be grafted by contacting the membrane with a grafting solution and exposing the membrane to electromagnetic radiation, typically within the ultraviolet portion of the spectrum. The monomers that are grafted are typically anionic or cationic. The grafted membranes can be used for filtering impurities, such as positively and negatively charged particles, from a liquid. Anionic membranes provide improved filtration of negatively charged impurities, while cationic membranes provide improved filtration of positively charged impurities.

公开(公告)号：US20230030188A1

公开(公告)日：2023-02-02

申请号：US17871249

申请日：2022-07-22

申请人： ENTEGRIS, INC.

发明人： Charles Miller ,  Alissa Wild

IPC分类号： H01L21/673 ,  G01N30/93 ,  G01N30/95

摘要： Adsorbents can be structured for use in a wafer container microenvironment. The loading of these adsorbents can be tailored to the particular contaminants to be removed from the wafer container microenvironment. The loading can include adsorbents for one or more contaminants, the contaminants including acids, bases, condensable organic compounds, and/or volatile organic compounds. The adsorbent can further include a moisture removal material such as a molecular sieve. The contaminants to be removed can be determined by cleaning or staging conditions for the wafer container, testing of previous adsorbents used in processes.

公开(公告)号：US20230002641A1

公开(公告)日：2023-01-05

申请号：US17846929

申请日：2022-06-22

申请人： ENTEGRIS, INC.

发明人： Rajiv K. Singh ,  Sunny De ,  Akshay Rajopadhye ,  Aditya D. Verma

IPC分类号： C09G1/02 ,  H01L21/321

摘要： The invention provides compositions useful in the polishing of transition metal-containing surfaces typically found on microelectronic devices. In one aspect, the invention provides a composition comprising: a liquid carrier; titania abrasive particles, wherein the particles are at least partially coated with alumina or amorphous silica to provide coated titania abrasive particles; wherein the coated titania abrasive particles have an average diameter of about 50 nm to about 250 nm; and a corrosion inhibitor. The invention, the compositions are advantageously utilized to polish microelectronic device substrates having transition metal-containing surfaces thereon. In certain embodiments, the surfaces are chosen from molybdenum and ruthenium-containing films and show markedly improved selectivity relative to thermal oxide.

公开(公告)号：US11538687B2

公开(公告)日：2022-12-27

申请号：US16713189

申请日：2019-12-13

申请人： ENTEGRIS, INC.

发明人： Ying Tang ,  Sharad N. Yedave ,  Joseph R. Despres ,  Joseph D. Sweeney

IPC分类号： H01L21/265 ,  H01J37/317 ,  H01J37/32

摘要： A system and method for fluorine ion implantation is described, which includes a fluorine gas source used to generate a fluorine ion species for implantation to a subject, and an arc chamber that includes one or more non-tungsten materials (graphite, carbide, fluoride, nitride, oxide, ceramic). The system minimizes formation of tungsten fluoride during system operation, thereby extending source life and promoting improved system performance. Further, the system can include a hydrogen and/or hydride gas source, and these gases can be used along with the fluorine gas to improve source lifetime and/or beam current.

公开(公告)号：US20220406637A1

公开(公告)日：2022-12-22

申请号：US17839208

申请日：2022-06-13

申请人： ENTEGRIS, INC.

发明人： Aaron Vestal ,  Matthew A. Fuller ,  Christopher Strickhouser

IPC分类号： H01L21/673

摘要： Gaskets for wafer containers include a seal body and a retention projection. The retention projection includes a retention segment extending from the seal body, a compression relief segment extending from the retention segment, and a bead disposed at an end of the compression relief segment. The compression relief segment has a cross-sectional width less than a cross-sectional width of the retention segment. The bead has a shape including portion having a width greater than a cross-sectional width of the gland at a corresponding depth in the gland. The gasket can be provided in a wafer container or a door of the wafer container.

公开(公告)号：US20220402945A1

公开(公告)日：2022-12-22

申请号：US17843021

申请日：2022-06-17

申请人： ENTEGRIS, INC.

发明人： David M. Ermert ,  Thomas M. Cameron

IPC分类号： C07F7/22

摘要： The invention provides a facile process for preparing certain organotin compounds having alkyl and aryl substituents. These compounds are useful as intermediates in the synthesis of certain alkylamino- and alkoxy-substituted alkyl tin compounds, which are in turn useful as precursors in the deposition of high-purity tin oxide films in, for example, extreme ultraviolet light (EUV) lithography techniques used in microelectronic device manufacturing.

公开(公告)号：US20220401893A1

公开(公告)日：2022-12-22

申请号：US17840394

申请日：2022-06-14

申请人： ENTEGRIS, INC.

发明人： Zhifeng Li ,  Sina Bonyadi ,  Pushkara Rao Varanasi

IPC分类号： B01D71/58 ,  B01D69/02 ,  B01D69/12 ,  B01D67/00 ,  B01D61/02

摘要： In summary, the disclosure provides certain membranes useful as filter materials in the removal of metal ions, metal particulates, and/or organic contaminants from liquid compositions, in particular liquid compositions used in the microelectronic device industry. The membranes of the disclosure are porous membranes comprised of poly(quinoline) polymers. Advantageously, the poly(quinoline) membranes are thermally stable and hydrolytically stable and can thus be cleaned between uses using acidic material such as dilute hydrochloric acid, without suffering from significant degradation. The poly(quinoline) polymers can be designed to be soluble in certain solvents, thus enabling the manufacture of the corresponding porous membranes by immersion-casting techniques.

公开(公告)号：US20220396715A1

公开(公告)日：2022-12-15

申请号：US17840448

申请日：2022-06-14

申请人： ENTEGRIS, INC.

发明人： Rajiv K. Singh ,  Sunny De

IPC分类号： C09G1/02 ,  B24B37/04

摘要： The invention provides improved slurries for the polishing of hard materials such as those having a Mohs hardness of greater than about 6. Exemplary hard surfaces include sapphire, silicon carbide, silicon nitride, and gallium nitride, and diamond. In the compositions and method of the invention, novel compositions comprising a unique combination of additives which surprisingly were found to uniformly disperse diamond particles having a wide range of particle size in a slurry. In the method of the invention, the generally alkaline slurry compositions of the invention are capable of utilizing diamond particle sizes of greater than 40 microns while effecting good removal rates. In such cases, when utilized with a suitable pad, rapid and planar grinding of silicon carbide, silicon nitride, sapphire, gallium nitride, and diamond is possible, with uniform surface damage.