- 专利标题: Etalon-based wavelength locking apparatus and alignment method
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申请号: US13732100申请日: 2012-12-31
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公开(公告)号: US10476230B2公开(公告)日: 2019-11-12
- 发明人: Xiaofeng Han , Timothy Butrie , David Coult
- 申请人: Xiaofeng Han , Timothy Butrie , David Coult
- 申请人地址: US CA Sunnyvale
- 专利权人: Infinera Corporation
- 当前专利权人: Infinera Corporation
- 当前专利权人地址: US CA Sunnyvale
- 代理商 David L. Soltz
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01B11/00 ; G01J3/45 ; H01S3/10 ; H01S3/08 ; G02B6/26 ; G02B6/42 ; H01S5/0687 ; H01S5/0683
摘要:
Consistent with the present disclosure, an apparatus for producing a control signal for a laser source is provided, comprising an etalon configured to receive light from the laser source and control circuitry that provides the control signal, wherein the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) the light received by the etalon from the laser source. Alternatively, the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) a combination of the forward transmission signal of the etalon and the backward reflection signal of the etalon. Also consistent with the present disclosure, a method of aligning an etalon-based wavelength locking apparatus is provided, wherein the etalon of the apparatus is aligned with an optical axis along a direction of propagation of the output of the laser source by monitoring the signals indicative of the forward transmission signal and the backward reflection signal of the etalon.
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