Invention Grant
- Patent Title: Method for fabricating a semiconductor chip panel
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Application No.: US15944306Application Date: 2018-04-03
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Publication No.: US10483133B2Publication Date: 2019-11-19
- Inventor: Daniel Porwol , Edward Fuergut
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/56 ; H01L23/28 ; H01L23/00 ; H01L23/31

Abstract:
A method for fabricating a semiconductor chip is disclosed. In an embodiment, the method includes providing a plurality of semiconductor chips, wherein each semiconductor chip comprises a first main face, a second main face opposite to the first main face and side faces connecting the first and second main faces, placing the semiconductor chips on a carrier with the second main faces facing the carrier and applying an encapsulation material by transfer molding thereby forming the semiconductor chip panel, wherein the encapsulation material is applied so that the side faces of the semiconductor chips are covered with the encapsulation material while the first main faces are not.
Public/Granted literature
- US20180226276A1 Method for Fabricating a Semiconductor Chip Panel Public/Granted day:2018-08-09
Information query
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